Thickness and structure of thin films determined by background analysis in hard X-ray photoelectron spectroscopy

Yi-Tao Cui, Sven Mosbæk Tougaard, Hiroshi Oji, Jin-Young Son, Yasuhiro Sakamoto, Takuya Matsumoto, Anli Yang, Osami Sakata, Huaping Song, Ichiro Hirosawa

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Original languageEnglish
Article number225307
JournalJournal of Applied Physics
Volume121
Number of pages10
ISSN0021-8979
DOIs
Publication statusPublished - 2017

Cite this

Cui, Y-T., Tougaard, S. M., Oji, H., Son, J-Y., Sakamoto, Y., Matsumoto, T., Yang, A., Sakata, O., Song, H., & Hirosawa, I. (2017). Thickness and structure of thin films determined by background analysis in hard X-ray photoelectron spectroscopy. Journal of Applied Physics, 121, [225307]. https://doi.org/10.1063/1.4985176