Quantitative analysis of reflection electron energy loss spectra for ultra-thin HfO2, Al2O3 and Hf-Al-O dielectric films on Si(100)

Quantitative analysis of reflection electron energy loss spectra for ultra-thin HfO₂, Al₂O₃ and Hf-Al-O dielectric films on Si(100)

Research output: Contribution to journal › Journal article › Research › peer-review

@article{e47b2c40df8a11db9628000ea68e967b,

title = "Quantitative analysis of reflection electron energy loss spectra for ultra-thin HfO2, Al2O3 and Hf-Al-O dielectric films on Si(100)",

author = "Hua Jin and Oh, \{Suhk Kun\} and Kang, \{Hee Jae\} and Sven Tougaard",

year = "2006",

language = "English",

pages = "083713",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "100",

}