Penetration of flourine into the silicon lattice during exposure to F atoms, F2, and XeF2: Implications for spontaneous etching reactions

Research output: Contribution to journalJournal articleResearchpeer-review

Original languageEnglish
JournalJournal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
VolumeA 25
Pages (from-to)96-103
ISSN0734-2101
Publication statusPublished - 2007

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