Fabrication of plasmonic waveguides by nanoimprint and UV-lithography

Rasmus B. Nielsen, Alexandra Boltasseva, Anders Kristensen, Sergey I. Bozhevolnyi, Valentyn S. Volkov, Irene Fernandez Cuesta, Anna Klukowska, TJ Suleski, WV Schoenfeld, JJ Wang

Research output: Chapter in Book/Report/Conference proceedingBook chapterResearchpeer-review

Abstract

We present a nanoimprint lithography based method for the fabrication of plasmonic waveguides in the form of V-grooves in a metal surface which support propagation of channel plasmon polaritons (CPPs). The developed method is compatible with large scale production, easily adaptable to different device designs and offers wafer-scale parallel fabrication of plasmonic components. The metal quality is improved in terms of surface roughness when compared to previous demonstrations where grooves were made by direct milling of metal, and the design allows easy fiber access at both ends of the waveguide. We demonstrate the design, fabrication and scanning near-field optical characterization of channel plasmon polariton waveguides at telecom wavelengths. Optical characterization of the fabricated waveguides shows low-loss (propagation length ~ 120 μm) CPP guiding.
Original languageEnglish
Title of host publicationAdvanced Fabrication Technologies For Micro/nano Optics and Photonics
EditorsJian Jim Wang, Winston V. Schoenfeld, Thomas J. Suleski
Number of pages8
Volume6883
Publication date7. Feb 2008
Article number688304
DOIs
Publication statusPublished - 7. Feb 2008

Fingerprint

lithography
polaritons
waveguides
fabrication
V grooves
propagation
grooves
metals
metal surfaces
near fields
surface roughness
wafers
scanning
fibers
wavelengths

Cite this

Nielsen, R. B., Boltasseva, A., Kristensen, A., Bozhevolnyi, S. I., Volkov, V. S., Cuesta, I. F., ... Wang, JJ. (2008). Fabrication of plasmonic waveguides by nanoimprint and UV-lithography. In J. J. Wang, W. V. Schoenfeld, & T. J. Suleski (Eds.), Advanced Fabrication Technologies For Micro/nano Optics and Photonics (Vol. 6883). [688304] https://doi.org/10.1117/12.762999
Nielsen, Rasmus B. ; Boltasseva, Alexandra ; Kristensen, Anders ; Bozhevolnyi, Sergey I. ; Volkov, Valentyn S. ; Cuesta, Irene Fernandez ; Klukowska, Anna ; Suleski, TJ ; Schoenfeld, WV ; Wang, JJ. / Fabrication of plasmonic waveguides by nanoimprint and UV-lithography. Advanced Fabrication Technologies For Micro/nano Optics and Photonics. editor / Jian Jim Wang ; Winston V. Schoenfeld ; Thomas J. Suleski. Vol. 6883 2008.
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abstract = "We present a nanoimprint lithography based method for the fabrication of plasmonic waveguides in the form of V-grooves in a metal surface which support propagation of channel plasmon polaritons (CPPs). The developed method is compatible with large scale production, easily adaptable to different device designs and offers wafer-scale parallel fabrication of plasmonic components. The metal quality is improved in terms of surface roughness when compared to previous demonstrations where grooves were made by direct milling of metal, and the design allows easy fiber access at both ends of the waveguide. We demonstrate the design, fabrication and scanning near-field optical characterization of channel plasmon polariton waveguides at telecom wavelengths. Optical characterization of the fabricated waveguides shows low-loss (propagation length ~ 120 μm) CPP guiding.",
author = "Nielsen, {Rasmus B.} and Alexandra Boltasseva and Anders Kristensen and Bozhevolnyi, {Sergey I.} and Volkov, {Valentyn S.} and Cuesta, {Irene Fernandez} and Anna Klukowska and TJ Suleski and WV Schoenfeld and JJ Wang",
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Nielsen, RB, Boltasseva, A, Kristensen, A, Bozhevolnyi, SI, Volkov, VS, Cuesta, IF, Klukowska, A, Suleski, TJ, Schoenfeld, WV & Wang, JJ 2008, Fabrication of plasmonic waveguides by nanoimprint and UV-lithography. in JJ Wang, W V. Schoenfeld & T J. Suleski (eds), Advanced Fabrication Technologies For Micro/nano Optics and Photonics. vol. 6883, 688304. https://doi.org/10.1117/12.762999

Fabrication of plasmonic waveguides by nanoimprint and UV-lithography. / Nielsen, Rasmus B.; Boltasseva, Alexandra; Kristensen, Anders; Bozhevolnyi, Sergey I.; Volkov, Valentyn S.; Cuesta, Irene Fernandez; Klukowska, Anna; Suleski, TJ; Schoenfeld, WV; Wang, JJ.

Advanced Fabrication Technologies For Micro/nano Optics and Photonics. ed. / Jian Jim Wang; Winston V. Schoenfeld; Thomas J. Suleski. Vol. 6883 2008. 688304.

Research output: Chapter in Book/Report/Conference proceedingBook chapterResearchpeer-review

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AU - Nielsen, Rasmus B.

AU - Boltasseva, Alexandra

AU - Kristensen, Anders

AU - Bozhevolnyi, Sergey I.

AU - Volkov, Valentyn S.

AU - Cuesta, Irene Fernandez

AU - Klukowska, Anna

AU - Suleski, TJ

AU - Schoenfeld, WV

AU - Wang, JJ

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N2 - We present a nanoimprint lithography based method for the fabrication of plasmonic waveguides in the form of V-grooves in a metal surface which support propagation of channel plasmon polaritons (CPPs). The developed method is compatible with large scale production, easily adaptable to different device designs and offers wafer-scale parallel fabrication of plasmonic components. The metal quality is improved in terms of surface roughness when compared to previous demonstrations where grooves were made by direct milling of metal, and the design allows easy fiber access at both ends of the waveguide. We demonstrate the design, fabrication and scanning near-field optical characterization of channel plasmon polariton waveguides at telecom wavelengths. Optical characterization of the fabricated waveguides shows low-loss (propagation length ~ 120 μm) CPP guiding.

AB - We present a nanoimprint lithography based method for the fabrication of plasmonic waveguides in the form of V-grooves in a metal surface which support propagation of channel plasmon polaritons (CPPs). The developed method is compatible with large scale production, easily adaptable to different device designs and offers wafer-scale parallel fabrication of plasmonic components. The metal quality is improved in terms of surface roughness when compared to previous demonstrations where grooves were made by direct milling of metal, and the design allows easy fiber access at both ends of the waveguide. We demonstrate the design, fabrication and scanning near-field optical characterization of channel plasmon polariton waveguides at telecom wavelengths. Optical characterization of the fabricated waveguides shows low-loss (propagation length ~ 120 μm) CPP guiding.

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DO - 10.1117/12.762999

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BT - Advanced Fabrication Technologies For Micro/nano Optics and Photonics

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Nielsen RB, Boltasseva A, Kristensen A, Bozhevolnyi SI, Volkov VS, Cuesta IF et al. Fabrication of plasmonic waveguides by nanoimprint and UV-lithography. In Wang JJ, V. Schoenfeld W, J. Suleski T, editors, Advanced Fabrication Technologies For Micro/nano Optics and Photonics. Vol. 6883. 2008. 688304 https://doi.org/10.1117/12.762999