Electronic and Optical Properties of Al2O3/SiO2 Thin Films grown on Si Substrate

Dahlang Tahir, Hyuk Lan Kwon, Hye Chung Shin, Suhk Kun Oh, Hee Jae Kang*, Sung Heo, Jae Gwan Chung, Jae Cheol Lee, Sven Mosbæk Tougaard

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

Original languageEnglish
JournalJournal of Physics D: Applied Physics
Volume43
Pages (from-to)255301
Number of pages7
ISSN0022-3727
DOIs
Publication statusPublished - 2010

Cite this

Tahir, D., Lan Kwon, H., Chung Shin, H., Oh, S. K., Kang, H. J., Heo, S., Gwan Chung, J., Cheol Lee, J., & Tougaard, S. M. (2010). Electronic and Optical Properties of Al2O3/SiO2 Thin Films grown on Si Substrate. Journal of Physics D: Applied Physics, 43, 255301. https://doi.org/10.1088/0022-3727/43/25/255301