Challenges of fabricating plasmonic and photonic structures with Neon ion beam milling

Research output: Contribution to conference without publisher/journalPosterResearch

Abstract

The unique properties of surface plasmons permitting subwavelength confinement of light, ultrafast propagation, and highly localized sensing are the key features for combining broadband optics and nanoscale electronics. Potential applications of plasmon-based devices span both nanoscale structures in future on-chip communication, processing and sensing, and macroscopic optical devices, such as polarizers and filters.
For all these kind of devices a reliable technique to produce plasmonic structures with nanometer precision is required. So far fabrication has been mainly conducted with well-established electron beam lithography and focussed ion beam milling (FIB) using Gallium ions. These techniques, however, are to some extend limited in their resolution, and in addition Gallium and Carbon are implanted and deposited into the plasmonic structures during FIB process, potentially changing plasmonic properties.
We are currently studying the capabilities of focussed Helium and Neon ion beam milling for the fabricating of plasmonic and photonic devices. We found that Neon ion beam milling enables us to prepare plasmonic structures, such as trenches (see Fig. 1) and V-grooves without doping and alloying effects specific to Galium FIB. Neon FIB milling is superior to Helium FIB milling in terms of the processing speed and smaller levels of implanted ions. From our perspective it is the most promising technique for the fabrication of individual plasmonic devices with a few nanometers precision.
The main challenges of utilization of Ne FIB include: 1) Fabrication of metallic trenches with high depth/width aspect ratios. (such structures are predicted theoretically to have exceptional optical properties); 2) Low writing-speed in comparison to conventional electron beam lithography and Ga FIB milling.
In our presentation we show the current progress in Neon FIB milling of plasmonic structures. We compare different materials, in particular poly- and mono-crystalline gold as well as thin films of Titanium Nitride, which are commonly used for plasmonic applications.
Original languageEnglish
Publication date8. Jun 2016
Number of pages1
Publication statusPublished - 8. Jun 2016
Event1st International Conference on Helium Ion Microscopy and Emerging Focused Ion Beam Technologies - Neumünster Abbey, Luxembourg City, Luxembourg
Duration: 8. Jun 201610. Jun 2016
Conference number: 1
http://hefib2016.list.lu/

Conference

Conference1st International Conference on Helium Ion Microscopy and Emerging Focused Ion Beam Technologies
Number1
LocationNeumünster Abbey
CountryLuxembourg
CityLuxembourg City
Period08/06/201610/06/2016
Internet address

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neon
ion beams
photonics
helium ions
fabrication
gallium
lithography
electron beams
V grooves
titanium nitrides
polarizers
plasmons
alloying
aspect ratio
ions
communication
chips
optics
gold
broadband

Cite this

Leißner, T., Fiutowski, J., Bozhevolnyi, S. I., Rubahn, H-G., & Chiriaev, S. (2016). Challenges of fabricating plasmonic and photonic structures with Neon ion beam milling. Poster session presented at 1st International Conference on Helium Ion Microscopy and Emerging Focused Ion Beam Technologies , Luxembourg City, Luxembourg.
Leißner, Till ; Fiutowski, Jacek ; Bozhevolnyi, Sergey I. ; Rubahn, Horst-Günter ; Chiriaev, Serguei . / Challenges of fabricating plasmonic and photonic structures with Neon ion beam milling. Poster session presented at 1st International Conference on Helium Ion Microscopy and Emerging Focused Ion Beam Technologies , Luxembourg City, Luxembourg.1 p.
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title = "Challenges of fabricating plasmonic and photonic structures with Neon ion beam milling",
abstract = "The unique properties of surface plasmons permitting subwavelength confinement of light, ultrafast propagation, and highly localized sensing are the key features for combining broadband optics and nanoscale electronics. Potential applications of plasmon-based devices span both nanoscale structures in future on-chip communication, processing and sensing, and macroscopic optical devices, such as polarizers and filters. For all these kind of devices a reliable technique to produce plasmonic structures with nanometer precision is required. So far fabrication has been mainly conducted with well-established electron beam lithography and focussed ion beam milling (FIB) using Gallium ions. These techniques, however, are to some extend limited in their resolution, and in addition Gallium and Carbon are implanted and deposited into the plasmonic structures during FIB process, potentially changing plasmonic properties.We are currently studying the capabilities of focussed Helium and Neon ion beam milling for the fabricating of plasmonic and photonic devices. We found that Neon ion beam milling enables us to prepare plasmonic structures, such as trenches (see Fig. 1) and V-grooves without doping and alloying effects specific to Galium FIB. Neon FIB milling is superior to Helium FIB milling in terms of the processing speed and smaller levels of implanted ions. From our perspective it is the most promising technique for the fabrication of individual plasmonic devices with a few nanometers precision. The main challenges of utilization of Ne FIB include: 1) Fabrication of metallic trenches with high depth/width aspect ratios. (such structures are predicted theoretically to have exceptional optical properties); 2) Low writing-speed in comparison to conventional electron beam lithography and Ga FIB milling.In our presentation we show the current progress in Neon FIB milling of plasmonic structures. We compare different materials, in particular poly- and mono-crystalline gold as well as thin films of Titanium Nitride, which are commonly used for plasmonic applications.",
author = "Till Lei{\ss}ner and Jacek Fiutowski and Bozhevolnyi, {Sergey I.} and Horst-G{\"u}nter Rubahn and Serguei Chiriaev",
year = "2016",
month = "6",
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language = "English",
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Leißner, T, Fiutowski, J, Bozhevolnyi, SI, Rubahn, H-G & Chiriaev, S 2016, 'Challenges of fabricating plasmonic and photonic structures with Neon ion beam milling', 1st International Conference on Helium Ion Microscopy and Emerging Focused Ion Beam Technologies , Luxembourg City, Luxembourg, 08/06/2016 - 10/06/2016.

Challenges of fabricating plasmonic and photonic structures with Neon ion beam milling. / Leißner, Till; Fiutowski, Jacek; Bozhevolnyi, Sergey I.; Rubahn, Horst-Günter; Chiriaev, Serguei .

2016. Poster session presented at 1st International Conference on Helium Ion Microscopy and Emerging Focused Ion Beam Technologies , Luxembourg City, Luxembourg.

Research output: Contribution to conference without publisher/journalPosterResearch

TY - CONF

T1 - Challenges of fabricating plasmonic and photonic structures with Neon ion beam milling

AU - Leißner, Till

AU - Fiutowski, Jacek

AU - Bozhevolnyi, Sergey I.

AU - Rubahn, Horst-Günter

AU - Chiriaev, Serguei

PY - 2016/6/8

Y1 - 2016/6/8

N2 - The unique properties of surface plasmons permitting subwavelength confinement of light, ultrafast propagation, and highly localized sensing are the key features for combining broadband optics and nanoscale electronics. Potential applications of plasmon-based devices span both nanoscale structures in future on-chip communication, processing and sensing, and macroscopic optical devices, such as polarizers and filters. For all these kind of devices a reliable technique to produce plasmonic structures with nanometer precision is required. So far fabrication has been mainly conducted with well-established electron beam lithography and focussed ion beam milling (FIB) using Gallium ions. These techniques, however, are to some extend limited in their resolution, and in addition Gallium and Carbon are implanted and deposited into the plasmonic structures during FIB process, potentially changing plasmonic properties.We are currently studying the capabilities of focussed Helium and Neon ion beam milling for the fabricating of plasmonic and photonic devices. We found that Neon ion beam milling enables us to prepare plasmonic structures, such as trenches (see Fig. 1) and V-grooves without doping and alloying effects specific to Galium FIB. Neon FIB milling is superior to Helium FIB milling in terms of the processing speed and smaller levels of implanted ions. From our perspective it is the most promising technique for the fabrication of individual plasmonic devices with a few nanometers precision. The main challenges of utilization of Ne FIB include: 1) Fabrication of metallic trenches with high depth/width aspect ratios. (such structures are predicted theoretically to have exceptional optical properties); 2) Low writing-speed in comparison to conventional electron beam lithography and Ga FIB milling.In our presentation we show the current progress in Neon FIB milling of plasmonic structures. We compare different materials, in particular poly- and mono-crystalline gold as well as thin films of Titanium Nitride, which are commonly used for plasmonic applications.

AB - The unique properties of surface plasmons permitting subwavelength confinement of light, ultrafast propagation, and highly localized sensing are the key features for combining broadband optics and nanoscale electronics. Potential applications of plasmon-based devices span both nanoscale structures in future on-chip communication, processing and sensing, and macroscopic optical devices, such as polarizers and filters. For all these kind of devices a reliable technique to produce plasmonic structures with nanometer precision is required. So far fabrication has been mainly conducted with well-established electron beam lithography and focussed ion beam milling (FIB) using Gallium ions. These techniques, however, are to some extend limited in their resolution, and in addition Gallium and Carbon are implanted and deposited into the plasmonic structures during FIB process, potentially changing plasmonic properties.We are currently studying the capabilities of focussed Helium and Neon ion beam milling for the fabricating of plasmonic and photonic devices. We found that Neon ion beam milling enables us to prepare plasmonic structures, such as trenches (see Fig. 1) and V-grooves without doping and alloying effects specific to Galium FIB. Neon FIB milling is superior to Helium FIB milling in terms of the processing speed and smaller levels of implanted ions. From our perspective it is the most promising technique for the fabrication of individual plasmonic devices with a few nanometers precision. The main challenges of utilization of Ne FIB include: 1) Fabrication of metallic trenches with high depth/width aspect ratios. (such structures are predicted theoretically to have exceptional optical properties); 2) Low writing-speed in comparison to conventional electron beam lithography and Ga FIB milling.In our presentation we show the current progress in Neon FIB milling of plasmonic structures. We compare different materials, in particular poly- and mono-crystalline gold as well as thin films of Titanium Nitride, which are commonly used for plasmonic applications.

M3 - Poster

ER -

Leißner T, Fiutowski J, Bozhevolnyi SI, Rubahn H-G, Chiriaev S. Challenges of fabricating plasmonic and photonic structures with Neon ion beam milling. 2016. Poster session presented at 1st International Conference on Helium Ion Microscopy and Emerging Focused Ion Beam Technologies , Luxembourg City, Luxembourg.