Ultralow-loss CMOS copper plasmonic waveguides

Dmitry Yu. Fedyanin, Dmitry I. Yakubovsky, Roman V. Kirtaev, Valentyn S. Volkov

Publikation: Bidrag til tidsskriftLetterForskningpeer review

Resumé

Surface plasmon polaritons can give a unique opportunity to manipulate light at a scale well below the diffraction limit reducing the size of optical components down to that of nanoelectronic circuits. At the same time, plasmonics is mostly based on noble metals, which are not compatible with microelectronics manufacturing technologies. This prevents plasmonic components from integration with both silicon photonics and silicon microelectronics. Here, we demonstrate ultralow-loss copper plasmonic waveguides fabricated in a simple complementary metal-oxide semiconductor (CMOS) compatible process, which can outperform gold plasmonic waveguides simultaneously providing long (>40 μm) propagation length and deep subwavelength (∼λ2/50, where λ is the free-space wavelength) mode confinement in the telecommunication spectral range. These results create the backbone for the development of a CMOS plasmonic platform and its integration in future electronic chips.
OriginalsprogEngelsk
TidsskriftNano Letters
Vol/bind16
Udgave nummer1
Sider (fra-til)362-366
ISSN1530-6984
DOI
StatusUdgivet - 2016

Fingeraftryk

Silicon
microelectronics
Microelectronics
Copper
CMOS
Waveguides
Metals
chips (electronics)
waveguides
copper
Nanoelectronics
silicon
Precious metals
noble metals
Gold
polaritons
Photonics
Telecommunication
telecommunication
manufacturing

Citer dette

Fedyanin, D. Y., Yakubovsky, D. I., Kirtaev, R. V., & Volkov, V. S. (2016). Ultralow-loss CMOS copper plasmonic waveguides. Nano Letters, 16(1), 362-366. https://doi.org/10.1021/acs.nanolett.5b03942
Fedyanin, Dmitry Yu. ; Yakubovsky, Dmitry I. ; Kirtaev, Roman V. ; Volkov, Valentyn S. / Ultralow-loss CMOS copper plasmonic waveguides. I: Nano Letters. 2016 ; Bind 16, Nr. 1. s. 362-366.
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Fedyanin, DY, Yakubovsky, DI, Kirtaev, RV & Volkov, VS 2016, 'Ultralow-loss CMOS copper plasmonic waveguides', Nano Letters, bind 16, nr. 1, s. 362-366. https://doi.org/10.1021/acs.nanolett.5b03942

Ultralow-loss CMOS copper plasmonic waveguides. / Fedyanin, Dmitry Yu. ; Yakubovsky, Dmitry I. ; Kirtaev, Roman V. ; Volkov, Valentyn S.

I: Nano Letters, Bind 16, Nr. 1, 2016, s. 362-366.

Publikation: Bidrag til tidsskriftLetterForskningpeer review

TY - JOUR

T1 - Ultralow-loss CMOS copper plasmonic waveguides

AU - Fedyanin, Dmitry Yu.

AU - Yakubovsky, Dmitry I.

AU - Kirtaev, Roman V.

AU - Volkov, Valentyn S.

PY - 2016

Y1 - 2016

N2 - Surface plasmon polaritons can give a unique opportunity to manipulate light at a scale well below the diffraction limit reducing the size of optical components down to that of nanoelectronic circuits. At the same time, plasmonics is mostly based on noble metals, which are not compatible with microelectronics manufacturing technologies. This prevents plasmonic components from integration with both silicon photonics and silicon microelectronics. Here, we demonstrate ultralow-loss copper plasmonic waveguides fabricated in a simple complementary metal-oxide semiconductor (CMOS) compatible process, which can outperform gold plasmonic waveguides simultaneously providing long (>40 μm) propagation length and deep subwavelength (∼λ2/50, where λ is the free-space wavelength) mode confinement in the telecommunication spectral range. These results create the backbone for the development of a CMOS plasmonic platform and its integration in future electronic chips.

AB - Surface plasmon polaritons can give a unique opportunity to manipulate light at a scale well below the diffraction limit reducing the size of optical components down to that of nanoelectronic circuits. At the same time, plasmonics is mostly based on noble metals, which are not compatible with microelectronics manufacturing technologies. This prevents plasmonic components from integration with both silicon photonics and silicon microelectronics. Here, we demonstrate ultralow-loss copper plasmonic waveguides fabricated in a simple complementary metal-oxide semiconductor (CMOS) compatible process, which can outperform gold plasmonic waveguides simultaneously providing long (>40 μm) propagation length and deep subwavelength (∼λ2/50, where λ is the free-space wavelength) mode confinement in the telecommunication spectral range. These results create the backbone for the development of a CMOS plasmonic platform and its integration in future electronic chips.

KW - Copper plasmonics

KW - plasmonic nanocircuitry

KW - CMOS plasmonics

KW - hybrid plasmonic waveguide

KW - near-field optical microscopy

U2 - 10.1021/acs.nanolett.5b03942

DO - 10.1021/acs.nanolett.5b03942

M3 - Letter

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SP - 362

EP - 366

JO - Nano Letters

JF - Nano Letters

SN - 1530-6984

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Fedyanin DY, Yakubovsky DI, Kirtaev RV, Volkov VS. Ultralow-loss CMOS copper plasmonic waveguides. Nano Letters. 2016;16(1):362-366. https://doi.org/10.1021/acs.nanolett.5b03942