Quantitative analysis of reflection electron energy loss spectra for ultra-thin HfO2, Al2O3 and Hf-Al-O dielectric films on Si(100)

Hua Jin, Suhk Kun Oh, Hee Jae Kang, Sven Tougaard

Publikation: Bidrag til tidsskriftTidsskriftartikelForskningpeer review

OriginalsprogEngelsk
TidsskriftOyo Buturi
Udgave nummer100
Sider (fra-til)083713
ISSN0369-8009
StatusUdgivet - 2006

Citer dette

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title = "Quantitative analysis of reflection electron energy loss spectra for ultra-thin HfO2, Al2O3 and Hf-Al-O dielectric films on Si(100)",
author = "Hua Jin and Oh, {Suhk Kun} and Kang, {Hee Jae} and Sven Tougaard",
year = "2006",
language = "English",
pages = "083713",
journal = "Oyo Buturi",
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number = "100",

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Quantitative analysis of reflection electron energy loss spectra for ultra-thin HfO2, Al2O3 and Hf-Al-O dielectric films on Si(100). / Jin, Hua; Oh, Suhk Kun; Kang, Hee Jae; Tougaard, Sven.

I: Oyo Buturi, Nr. 100, 2006, s. 083713.

Publikation: Bidrag til tidsskriftTidsskriftartikelForskningpeer review

TY - JOUR

T1 - Quantitative analysis of reflection electron energy loss spectra for ultra-thin HfO2, Al2O3 and Hf-Al-O dielectric films on Si(100)

AU - Jin, Hua

AU - Oh, Suhk Kun

AU - Kang, Hee Jae

AU - Tougaard, Sven

PY - 2006

Y1 - 2006

M3 - Journal article

SP - 083713

JO - Oyo Buturi

JF - Oyo Buturi

SN - 0369-8009

IS - 100

ER -