Plasma chemistry in an atmospheric pressure Ar/NH3 dielectric barrier discharge

A. Fateev, F. Leipold, Y. Kusano, B. Stenum, E.L. Tsakadze, H. Bindslev

Publikation: Bidrag til tidsskriftTidsskriftartikelForskningpeer review

Resumé

An atmospheric pressure dielectric barrier discharge (DBD) in Ar/NH3 (0.1 - 10%) mixtures with a parallel plate electrode geometry was studied. The plasma was investigated by emission and absorption spectroscopy in the UV spectral range. Discharge current and voltage were measured as well. UV absorption spectroscopy was also employed for the detection of stable products in the exhaust gas. To clarify the different processes for ammonia decomposition, N-2(2 - 10%) was added to the plasma. Modeling of the chemical kinetics in an Ar/NH3 plasma was performed as well. The dominant stable products of an atmospheric pressure Ar/NH3 DBD are H-2, N-2 and N2H4. The hydrazine (N2H4) concentration in the plasma and in the exhaust gases at various ammonia concentrations and different discharge powers was measured. Thermal N2H4 decomposition into NH2 radicals may be used for NOx reduction processes.
OriginalsprogEngelsk
TidsskriftPlasma Processes and Polymers
Vol/bind2
Udgave nummer3
Sider (fra-til)193-200
ISSN1612-8850
DOI
StatusUdgivet - 2005
Udgivet eksterntJa

Fingeraftryk

plasma chemistry
Atmospheric pressure
atmospheric pressure
Plasmas
exhaust gases
hydrazine
Exhaust gases
Absorption spectroscopy
Ammonia
ammonia
absorption spectroscopy
Hydrazine
Emission spectroscopy
hydrazines
products
Ultraviolet spectroscopy
parallel plates
Reaction kinetics
Discharge (fluid mechanics)
thermal decomposition

Citer dette

Fateev, A. ; Leipold, F. ; Kusano, Y. ; Stenum, B. ; Tsakadze, E.L. ; Bindslev, H. / Plasma chemistry in an atmospheric pressure Ar/NH3 dielectric barrier discharge. I: Plasma Processes and Polymers. 2005 ; Bind 2, Nr. 3. s. 193-200.
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title = "Plasma chemistry in an atmospheric pressure Ar/NH3 dielectric barrier discharge",
abstract = "An atmospheric pressure dielectric barrier discharge (DBD) in Ar/NH3 (0.1 - 10{\%}) mixtures with a parallel plate electrode geometry was studied. The plasma was investigated by emission and absorption spectroscopy in the UV spectral range. Discharge current and voltage were measured as well. UV absorption spectroscopy was also employed for the detection of stable products in the exhaust gas. To clarify the different processes for ammonia decomposition, N-2(2 - 10{\%}) was added to the plasma. Modeling of the chemical kinetics in an Ar/NH3 plasma was performed as well. The dominant stable products of an atmospheric pressure Ar/NH3 DBD are H-2, N-2 and N2H4. The hydrazine (N2H4) concentration in the plasma and in the exhaust gases at various ammonia concentrations and different discharge powers was measured. Thermal N2H4 decomposition into NH2 radicals may be used for NOx reduction processes.",
author = "A. Fateev and F. Leipold and Y. Kusano and B. Stenum and E.L. Tsakadze and H. Bindslev",
year = "2005",
doi = "10.1002/ppap.200400051",
language = "English",
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pages = "193--200",
journal = "Plasma Processes and Polymers",
issn = "1612-8850",
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Plasma chemistry in an atmospheric pressure Ar/NH3 dielectric barrier discharge. / Fateev, A.; Leipold, F.; Kusano, Y.; Stenum, B.; Tsakadze, E.L.; Bindslev, H.

I: Plasma Processes and Polymers, Bind 2, Nr. 3, 2005, s. 193-200.

Publikation: Bidrag til tidsskriftTidsskriftartikelForskningpeer review

TY - JOUR

T1 - Plasma chemistry in an atmospheric pressure Ar/NH3 dielectric barrier discharge

AU - Fateev, A.

AU - Leipold, F.

AU - Kusano, Y.

AU - Stenum, B.

AU - Tsakadze, E.L.

AU - Bindslev, H.

PY - 2005

Y1 - 2005

N2 - An atmospheric pressure dielectric barrier discharge (DBD) in Ar/NH3 (0.1 - 10%) mixtures with a parallel plate electrode geometry was studied. The plasma was investigated by emission and absorption spectroscopy in the UV spectral range. Discharge current and voltage were measured as well. UV absorption spectroscopy was also employed for the detection of stable products in the exhaust gas. To clarify the different processes for ammonia decomposition, N-2(2 - 10%) was added to the plasma. Modeling of the chemical kinetics in an Ar/NH3 plasma was performed as well. The dominant stable products of an atmospheric pressure Ar/NH3 DBD are H-2, N-2 and N2H4. The hydrazine (N2H4) concentration in the plasma and in the exhaust gases at various ammonia concentrations and different discharge powers was measured. Thermal N2H4 decomposition into NH2 radicals may be used for NOx reduction processes.

AB - An atmospheric pressure dielectric barrier discharge (DBD) in Ar/NH3 (0.1 - 10%) mixtures with a parallel plate electrode geometry was studied. The plasma was investigated by emission and absorption spectroscopy in the UV spectral range. Discharge current and voltage were measured as well. UV absorption spectroscopy was also employed for the detection of stable products in the exhaust gas. To clarify the different processes for ammonia decomposition, N-2(2 - 10%) was added to the plasma. Modeling of the chemical kinetics in an Ar/NH3 plasma was performed as well. The dominant stable products of an atmospheric pressure Ar/NH3 DBD are H-2, N-2 and N2H4. The hydrazine (N2H4) concentration in the plasma and in the exhaust gases at various ammonia concentrations and different discharge powers was measured. Thermal N2H4 decomposition into NH2 radicals may be used for NOx reduction processes.

U2 - 10.1002/ppap.200400051

DO - 10.1002/ppap.200400051

M3 - Journal article

VL - 2

SP - 193

EP - 200

JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

SN - 1612-8850

IS - 3

ER -