Photothermal modification of plasmonic structures

Xiaolong Zhu (Opfinder), Anders Kristensen (Opfinder), Emil Højlund-Nielsen (Opfinder), Christoph Vannahme (Opfinder), N. Asger Mortensen (Opfinder)

Publikation: Patent

49 Downloads (Pure)

Abstract

There is presented a method for geometrically modifying plasmonic structures on a support structure, such as for printing or recording, said method comprising changing a geometry specifically of plasmonic structures, wherein said changing the geometry is carried out by photothermally melting at least a portion of each of the plasmonic structures within the second plurality of plasmonic structures by irradiating, the plasmonic structures with incident electromagnetic radiation having an incident intensity in a plane of the second plurality of plasmonic structures, wherein said incident intensity is less than an incident intensity required to melt a film of a corresponding material and a corresponding thickness as the plasmonic structures within the second plurality of plasmonic structures.

OriginalsprogEngelsk
IPCG02B 5/ 26 A N
PatentnummerWO2016198657
Journaliseringsdato15/12/2016
Prioritetsdato12/06/2015
PrioritetsnummerEP20150171905
StatusUdgivet - 15. dec. 2016
Udgivet eksterntJa

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