Metastable molecular precursor for the dissociative adsorption of oxygen on Si(111)

U. Höfer; P. Morgen; W. Wurth; E. Umbach

doi:10.1103/PhysRevLett.55.2979

Metastable molecular precursor for the dissociative adsorption of oxygen on Si(111)

U. Höfer^*, P. Morgen, W. Wurth, E. Umbach

^*Kontaktforfatter for dette arbejde

Institut for Grøn Teknologi (IGT)

Publikation: Bidrag til tidsskrift › Tidsskriftartikel › Forskning › peer review

Abstrakt

The initial adsorption of oxygen on Si(111) surfaces proceeds via a molecular intermediate which is precursor to the stable dissociated adsorption state. This metastable precursor can only be observed under certain conditions; its conversion to the stable state depends on temperature, probe, surface structure, impurities, and oxygen coverage. The precursor is likely to be a peroxy-bridge configuration whereas the stable dissociated oxygen species forms short-bridge bonds between adjacent Si atoms.

Originalsprog	Engelsk
Tidsskrift	Physical Review Letters
Vol/bind	55
Udgave nummer	27
Sider (fra-til)	2979-2982
Antal sider	4
ISSN	0031-9007
DOI	https://doi.org/10.1103/PhysRevLett.55.2979
Status	Udgivet - 1. jan. 1985

Dokumenter og links

10.1103/PhysRevLett.55.2979

Link to publication in Scopus

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Citationsformater

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abstract = "The initial adsorption of oxygen on Si(111) surfaces proceeds via a molecular intermediate which is precursor to the stable dissociated adsorption state. This metastable precursor can only be observed under certain conditions; its conversion to the stable state depends on temperature, probe, surface structure, impurities, and oxygen coverage. The precursor is likely to be a peroxy-bridge configuration whereas the stable dissociated oxygen species forms short-bridge bonds between adjacent Si atoms.",

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Y1 - 1985/1/1

N2 - The initial adsorption of oxygen on Si(111) surfaces proceeds via a molecular intermediate which is precursor to the stable dissociated adsorption state. This metastable precursor can only be observed under certain conditions; its conversion to the stable state depends on temperature, probe, surface structure, impurities, and oxygen coverage. The precursor is likely to be a peroxy-bridge configuration whereas the stable dissociated oxygen species forms short-bridge bonds between adjacent Si atoms.

AB - The initial adsorption of oxygen on Si(111) surfaces proceeds via a molecular intermediate which is precursor to the stable dissociated adsorption state. This metastable precursor can only be observed under certain conditions; its conversion to the stable state depends on temperature, probe, surface structure, impurities, and oxygen coverage. The precursor is likely to be a peroxy-bridge configuration whereas the stable dissociated oxygen species forms short-bridge bonds between adjacent Si atoms.

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