Metastable molecular precursor for the dissociative adsorption of oxygen on Si(111)

U. Höfer*, P. Morgen, W. Wurth, E. Umbach

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Abstrakt

The initial adsorption of oxygen on Si(111) surfaces proceeds via a molecular intermediate which is precursor to the stable dissociated adsorption state. This metastable precursor can only be observed under certain conditions; its conversion to the stable state depends on temperature, probe, surface structure, impurities, and oxygen coverage. The precursor is likely to be a peroxy-bridge configuration whereas the stable dissociated oxygen species forms short-bridge bonds between adjacent Si atoms.

OriginalsprogEngelsk
TidsskriftPhysical Review Letters
Vol/bind55
Udgave nummer27
Sider (fra-til)2979-2982
Antal sider4
ISSN0031-9007
DOI
StatusUdgivet - 1. jan. 1985

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