Height patterning of nanostructured surfaces with a focused helium ion beam: a precise and gentle non-sputtering method

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Abstrakt

This work presents a new technique for surface patterning with focused ion beams. The technique is based on chemical decomposition in the bulk of a polymer substrate with negligible surface sputtering effects. By using a focused helium ion beam, generated in a helium ion microscope, we show that the surface height of polymethyl methacrylate substrates can be patterned with nanometer depth precision, while preserving the essential features of the nanostructures prefabricated on this surface. The key factors that control this patterning process are discussed.

OriginalsprogEngelsk
TidsskriftNanotechnology
Vol/bind31
Udgave nummer14
Antal sider1
ISSN0957-4484
DOI
StatusUdgivet - 3. apr. 2020

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