FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE

Publikation: Konferencebidrag uden forlag/tidsskriftPosterForskning

Resumé

Nanofabrication with focused ion beams (FIB) is a widely used technology for tailoring of e.g. optical and plasmonic elements [1]. The technology is essentially based on material removal by ion sputtering (ion milling) or ion-beam assisted chemical etching [1]. In addition, FIBs can decompose polymer materials, which results in material shrinkage in the irradiated areas [2]. In this work, we demonstrate that this mechanism can be used for nanopatterning thin metal films deposited on PMMA resist spin-coated onto a silicon substrate. For this purpose, the samples were irradiated with He+ FIB in a Zeiss Nanofab HIM under different conditions. We investigated the effect of different landing energies as well as different metal and PMMA thicknesses, while keeping the dose below the critical value [3]. In addition, irradiation tests with Ne+ and Ga+ ion beams were also performed. The influence of landing energy, metal thickness, and metal composition was not pronounced. On the other hand, the PMMA thickness showed a significant effect on the depth of the exposed areas. We used SRIM simulations to interpret these results. In thick PMMA, the majority of the collision events occurred in the bulk PMMA, which would cause more shrinkage compared to the situation in thin PMMA layers, where the majority of the collision events took place in the underlying silicon substrate. The depression generated by exposure to Ga+ beam are rougher and around three times deeper compared to the irradiation to He+ and Ne+ ions. We presume that it is due to material removal by sputtering with the Ga+ beam.
[1] G. Hlawacek and A. Gölzhäuser, Helium Ion Microscopy, Switzerland (2016).
[2] L. Sawyer et al. Polymer Microscopy, Springer New York (2008).
[3] F. Schrempel et al. Applied Surface Science 189, 102-112 (2002).
OriginalsprogEngelsk
Publikationsdato11. jun. 2018
StatusUdgivet - 11. jun. 2018
Begivenhed2nd international HeFIB conference on Helium and emerging Focused Ion Beams - Salzgasse, 4, 01067 , Dresden, Tyskland
Varighed: 11. jun. 201813. jun. 2018
https://www.hzdr.de/db/Cms?pNid=3699

Konference

Konference2nd international HeFIB conference on Helium and emerging Focused Ion Beams
LokationSalzgasse, 4, 01067
LandTyskland
ByDresden
Periode11/06/201813/06/2018
Internetadresse

Fingeraftryk

metal films
sputtering
ion beams
landing
shrinkage
machining
metals
microscopy
ions
irradiation
collisions
nanofabrication
helium ions
polymers
silicon
Switzerland
etching
dosage
energy
causes

Citer dette

Tavares, L., Adashkevich, V., Chiriaev, S., & Rubahn, H-G. (2018). FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE. Poster session præsenteret på 2nd international HeFIB conference on Helium and emerging Focused Ion Beams, Dresden, Tyskland.
Tavares, Luciana ; Adashkevich, Vadzim ; Chiriaev, Serguei ; Rubahn, Horst-Günter. / FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE. Poster session præsenteret på 2nd international HeFIB conference on Helium and emerging Focused Ion Beams, Dresden, Tyskland.
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title = "FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE",
abstract = "Nanofabrication with focused ion beams (FIB) is a widely used technology for tailoring of e.g. optical and plasmonic elements [1]. The technology is essentially based on material removal by ion sputtering (ion milling) or ion-beam assisted chemical etching [1]. In addition, FIBs can decompose polymer materials, which results in material shrinkage in the irradiated areas [2]. In this work, we demonstrate that this mechanism can be used for nanopatterning thin metal films deposited on PMMA resist spin-coated onto a silicon substrate. For this purpose, the samples were irradiated with He+ FIB in a Zeiss Nanofab HIM under different conditions. We investigated the effect of different landing energies as well as different metal and PMMA thicknesses, while keeping the dose below the critical value [3]. In addition, irradiation tests with Ne+ and Ga+ ion beams were also performed. The influence of landing energy, metal thickness, and metal composition was not pronounced. On the other hand, the PMMA thickness showed a significant effect on the depth of the exposed areas. We used SRIM simulations to interpret these results. In thick PMMA, the majority of the collision events occurred in the bulk PMMA, which would cause more shrinkage compared to the situation in thin PMMA layers, where the majority of the collision events took place in the underlying silicon substrate. The depression generated by exposure to Ga+ beam are rougher and around three times deeper compared to the irradiation to He+ and Ne+ ions. We presume that it is due to material removal by sputtering with the Ga+ beam.[1] G. Hlawacek and A. G{\"o}lzh{\"a}user, Helium Ion Microscopy, Switzerland (2016). [2] L. Sawyer et al. Polymer Microscopy, Springer New York (2008).[3] F. Schrempel et al. Applied Surface Science 189, 102-112 (2002).",
author = "Luciana Tavares and Vadzim Adashkevich and Serguei Chiriaev and Horst-G{\"u}nter Rubahn",
year = "2018",
month = "6",
day = "11",
language = "English",
note = "2nd international HeFIB conference on Helium and emerging Focused Ion Beams, HeFIB 2018 ; Conference date: 11-06-2018 Through 13-06-2018",
url = "https://www.hzdr.de/db/Cms?pNid=3699",

}

Tavares, L, Adashkevich, V, Chiriaev, S & Rubahn, H-G 2018, 'FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE' 2nd international HeFIB conference on Helium and emerging Focused Ion Beams, Dresden, Tyskland, 11/06/2018 - 13/06/2018, .

FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE. / Tavares, Luciana ; Adashkevich, Vadzim; Chiriaev, Serguei ; Rubahn, Horst-Günter.

2018. Poster session præsenteret på 2nd international HeFIB conference on Helium and emerging Focused Ion Beams, Dresden, Tyskland.

Publikation: Konferencebidrag uden forlag/tidsskriftPosterForskning

TY - CONF

T1 - FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE

AU - Tavares, Luciana

AU - Adashkevich, Vadzim

AU - Chiriaev, Serguei

AU - Rubahn, Horst-Günter

PY - 2018/6/11

Y1 - 2018/6/11

N2 - Nanofabrication with focused ion beams (FIB) is a widely used technology for tailoring of e.g. optical and plasmonic elements [1]. The technology is essentially based on material removal by ion sputtering (ion milling) or ion-beam assisted chemical etching [1]. In addition, FIBs can decompose polymer materials, which results in material shrinkage in the irradiated areas [2]. In this work, we demonstrate that this mechanism can be used for nanopatterning thin metal films deposited on PMMA resist spin-coated onto a silicon substrate. For this purpose, the samples were irradiated with He+ FIB in a Zeiss Nanofab HIM under different conditions. We investigated the effect of different landing energies as well as different metal and PMMA thicknesses, while keeping the dose below the critical value [3]. In addition, irradiation tests with Ne+ and Ga+ ion beams were also performed. The influence of landing energy, metal thickness, and metal composition was not pronounced. On the other hand, the PMMA thickness showed a significant effect on the depth of the exposed areas. We used SRIM simulations to interpret these results. In thick PMMA, the majority of the collision events occurred in the bulk PMMA, which would cause more shrinkage compared to the situation in thin PMMA layers, where the majority of the collision events took place in the underlying silicon substrate. The depression generated by exposure to Ga+ beam are rougher and around three times deeper compared to the irradiation to He+ and Ne+ ions. We presume that it is due to material removal by sputtering with the Ga+ beam.[1] G. Hlawacek and A. Gölzhäuser, Helium Ion Microscopy, Switzerland (2016). [2] L. Sawyer et al. Polymer Microscopy, Springer New York (2008).[3] F. Schrempel et al. Applied Surface Science 189, 102-112 (2002).

AB - Nanofabrication with focused ion beams (FIB) is a widely used technology for tailoring of e.g. optical and plasmonic elements [1]. The technology is essentially based on material removal by ion sputtering (ion milling) or ion-beam assisted chemical etching [1]. In addition, FIBs can decompose polymer materials, which results in material shrinkage in the irradiated areas [2]. In this work, we demonstrate that this mechanism can be used for nanopatterning thin metal films deposited on PMMA resist spin-coated onto a silicon substrate. For this purpose, the samples were irradiated with He+ FIB in a Zeiss Nanofab HIM under different conditions. We investigated the effect of different landing energies as well as different metal and PMMA thicknesses, while keeping the dose below the critical value [3]. In addition, irradiation tests with Ne+ and Ga+ ion beams were also performed. The influence of landing energy, metal thickness, and metal composition was not pronounced. On the other hand, the PMMA thickness showed a significant effect on the depth of the exposed areas. We used SRIM simulations to interpret these results. In thick PMMA, the majority of the collision events occurred in the bulk PMMA, which would cause more shrinkage compared to the situation in thin PMMA layers, where the majority of the collision events took place in the underlying silicon substrate. The depression generated by exposure to Ga+ beam are rougher and around three times deeper compared to the irradiation to He+ and Ne+ ions. We presume that it is due to material removal by sputtering with the Ga+ beam.[1] G. Hlawacek and A. Gölzhäuser, Helium Ion Microscopy, Switzerland (2016). [2] L. Sawyer et al. Polymer Microscopy, Springer New York (2008).[3] F. Schrempel et al. Applied Surface Science 189, 102-112 (2002).

M3 - Poster

ER -

Tavares L, Adashkevich V, Chiriaev S, Rubahn H-G. FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE. 2018. Poster session præsenteret på 2nd international HeFIB conference on Helium and emerging Focused Ion Beams, Dresden, Tyskland.