FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE

Publikation: Konferencebidrag uden forlag/tidsskriftPosterForskning

Resumé

Nanofabrication with focused ion beams (FIB) is a widely used technology for tailoring of e.g. optical and plasmonic elements [1]. The technology is essentially based on material removal by ion sputtering (ion milling) or ion-beam assisted chemical etching [1]. In addition, FIBs can decompose polymer materials, which results in material shrinkage in the irradiated areas [2]. In this work, we demonstrate that this mechanism can be used for nanopatterning thin metal films deposited on PMMA resist spin-coated onto a silicon substrate. For this purpose, the samples were irradiated with He+ FIB in a Zeiss Nanofab HIM under different conditions. We investigated the effect of different landing energies as well as different metal and PMMA thicknesses, while keeping the dose below the critical value [3]. In addition, irradiation tests with Ne+ and Ga+ ion beams were also performed. The influence of both landing energy and metal thickness was not pronounced. On the other hand, the PMMA thickness showed a significant effect on the depth of the exposed areas. We used SRIM simulations to interpret these results. In thick PMMA, the majority of the collision events occurred in the bulk PMMA, which would cause more shrinkage compared to the situation in thin PMMA layers, where the majority of the collision events took place in the underlying silicon substrate. The depression generated by exposure to Ga+ beam are rougher and around three times deeper compared to the irradiation to He+ and Ne+ ions. We presume that it is due to material removal by sputtering with the Ga+ beam.
1. G. Hlawacek and A. Gölzhäuser, Helium Ion Microscopy, Switzerland (2016).
2. L. Sawyer et al. Polymer Microscopy, Springer New York (2008).
3. F. Schrempel et al. Applied Surface Science 189, 102-112 (2002).
OriginalsprogEngelsk
Publikationsdato31. maj 2018
StatusUdgivet - 31. maj 2018
BegivenhedInternational Conference on Nanotechnology and Innovation in the Baltic Sea Region 2018 - University of Southern Denmark, Sønderborg, Danmark
Varighed: 30. maj 20181. jun. 2018
https://www.sdu.dk/en/nibs2018

Konference

KonferenceInternational Conference on Nanotechnology and Innovation in the Baltic Sea Region 2018
LokationUniversity of Southern Denmark
LandDanmark
BySønderborg
Periode30/05/201801/06/2018
Internetadresse

Fingeraftryk

metal films
sputtering
ion beams
landing
shrinkage
machining
microscopy
ions
irradiation
collisions
nanofabrication
helium ions
polymers
silicon
Switzerland
metals
etching
dosage
energy
causes

Citer dette

Tavares, L., Adashkevich, V., Chiriaev, S., & Rubahn, H-G. (2018). FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE. Poster session præsenteret på International Conference on Nanotechnology and Innovation in the Baltic Sea Region 2018, Sønderborg, Danmark.
Tavares, Luciana ; Adashkevich, Vadzim ; Chiriaev, Serguei ; Rubahn, Horst-Günter. / FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE. Poster session præsenteret på International Conference on Nanotechnology and Innovation in the Baltic Sea Region 2018, Sønderborg, Danmark.
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title = "FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE",
abstract = "Nanofabrication with focused ion beams (FIB) is a widely used technology for tailoring of e.g. optical and plasmonic elements [1]. The technology is essentially based on material removal by ion sputtering (ion milling) or ion-beam assisted chemical etching [1]. In addition, FIBs can decompose polymer materials, which results in material shrinkage in the irradiated areas [2]. In this work, we demonstrate that this mechanism can be used for nanopatterning thin metal films deposited on PMMA resist spin-coated onto a silicon substrate. For this purpose, the samples were irradiated with He+ FIB in a Zeiss Nanofab HIM under different conditions. We investigated the effect of different landing energies as well as different metal and PMMA thicknesses, while keeping the dose below the critical value [3]. In addition, irradiation tests with Ne+ and Ga+ ion beams were also performed. The influence of both landing energy and metal thickness was not pronounced. On the other hand, the PMMA thickness showed a significant effect on the depth of the exposed areas. We used SRIM simulations to interpret these results. In thick PMMA, the majority of the collision events occurred in the bulk PMMA, which would cause more shrinkage compared to the situation in thin PMMA layers, where the majority of the collision events took place in the underlying silicon substrate. The depression generated by exposure to Ga+ beam are rougher and around three times deeper compared to the irradiation to He+ and Ne+ ions. We presume that it is due to material removal by sputtering with the Ga+ beam.1. G. Hlawacek and A. G{\"o}lzh{\"a}user, Helium Ion Microscopy, Switzerland (2016). 2. L. Sawyer et al. Polymer Microscopy, Springer New York (2008).3. F. Schrempel et al. Applied Surface Science 189, 102-112 (2002).",
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Tavares, L, Adashkevich, V, Chiriaev, S & Rubahn, H-G 2018, 'FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE' International Conference on Nanotechnology and Innovation in the Baltic Sea Region 2018, Sønderborg, Danmark, 30/05/2018 - 01/06/2018, .

FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE. / Tavares, Luciana ; Adashkevich, Vadzim; Chiriaev, Serguei ; Rubahn, Horst-Günter.

2018. Poster session præsenteret på International Conference on Nanotechnology and Innovation in the Baltic Sea Region 2018, Sønderborg, Danmark.

Publikation: Konferencebidrag uden forlag/tidsskriftPosterForskning

TY - CONF

T1 - FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE

AU - Tavares, Luciana

AU - Adashkevich, Vadzim

AU - Chiriaev, Serguei

AU - Rubahn, Horst-Günter

PY - 2018/5/31

Y1 - 2018/5/31

N2 - Nanofabrication with focused ion beams (FIB) is a widely used technology for tailoring of e.g. optical and plasmonic elements [1]. The technology is essentially based on material removal by ion sputtering (ion milling) or ion-beam assisted chemical etching [1]. In addition, FIBs can decompose polymer materials, which results in material shrinkage in the irradiated areas [2]. In this work, we demonstrate that this mechanism can be used for nanopatterning thin metal films deposited on PMMA resist spin-coated onto a silicon substrate. For this purpose, the samples were irradiated with He+ FIB in a Zeiss Nanofab HIM under different conditions. We investigated the effect of different landing energies as well as different metal and PMMA thicknesses, while keeping the dose below the critical value [3]. In addition, irradiation tests with Ne+ and Ga+ ion beams were also performed. The influence of both landing energy and metal thickness was not pronounced. On the other hand, the PMMA thickness showed a significant effect on the depth of the exposed areas. We used SRIM simulations to interpret these results. In thick PMMA, the majority of the collision events occurred in the bulk PMMA, which would cause more shrinkage compared to the situation in thin PMMA layers, where the majority of the collision events took place in the underlying silicon substrate. The depression generated by exposure to Ga+ beam are rougher and around three times deeper compared to the irradiation to He+ and Ne+ ions. We presume that it is due to material removal by sputtering with the Ga+ beam.1. G. Hlawacek and A. Gölzhäuser, Helium Ion Microscopy, Switzerland (2016). 2. L. Sawyer et al. Polymer Microscopy, Springer New York (2008).3. F. Schrempel et al. Applied Surface Science 189, 102-112 (2002).

AB - Nanofabrication with focused ion beams (FIB) is a widely used technology for tailoring of e.g. optical and plasmonic elements [1]. The technology is essentially based on material removal by ion sputtering (ion milling) or ion-beam assisted chemical etching [1]. In addition, FIBs can decompose polymer materials, which results in material shrinkage in the irradiated areas [2]. In this work, we demonstrate that this mechanism can be used for nanopatterning thin metal films deposited on PMMA resist spin-coated onto a silicon substrate. For this purpose, the samples were irradiated with He+ FIB in a Zeiss Nanofab HIM under different conditions. We investigated the effect of different landing energies as well as different metal and PMMA thicknesses, while keeping the dose below the critical value [3]. In addition, irradiation tests with Ne+ and Ga+ ion beams were also performed. The influence of both landing energy and metal thickness was not pronounced. On the other hand, the PMMA thickness showed a significant effect on the depth of the exposed areas. We used SRIM simulations to interpret these results. In thick PMMA, the majority of the collision events occurred in the bulk PMMA, which would cause more shrinkage compared to the situation in thin PMMA layers, where the majority of the collision events took place in the underlying silicon substrate. The depression generated by exposure to Ga+ beam are rougher and around three times deeper compared to the irradiation to He+ and Ne+ ions. We presume that it is due to material removal by sputtering with the Ga+ beam.1. G. Hlawacek and A. Gölzhäuser, Helium Ion Microscopy, Switzerland (2016). 2. L. Sawyer et al. Polymer Microscopy, Springer New York (2008).3. F. Schrempel et al. Applied Surface Science 189, 102-112 (2002).

M3 - Poster

ER -

Tavares L, Adashkevich V, Chiriaev S, Rubahn H-G. FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE. 2018. Poster session præsenteret på International Conference on Nanotechnology and Innovation in the Baltic Sea Region 2018, Sønderborg, Danmark.