Fast‐writing E‐beam for defining large arrays of nano‐holes

Emil Højlund-Nielsen, Jeppe Sandvik Clausen, Alexander Bruun Christiansen, Tine Greibe, N. Asger Mortensen, Anders Kristensen

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Abstract

Efficient nanoscale patterning of large areas is required for sub-wavelength optics. For example, 200 nm periodic structures are often too small to be made with standard UV- and DUV-equipment. Still, the final product must be made at an economic cost. Here we use a fast-writing strategy described in [1], where electron beam lithography (EBL) with a focused Gaussian beam is used to define shapes directly. The serial technique is optimized for speed and pattern fidelity to a maximum writing speed of around 30 min/cm2 for 200 nm periods in 2D lattices. The overall costs in terms of machine time and feasibility are assessed for different topographies and dimensions.
OriginalsprogEngelsk
TitelProceedings of the 39th International Conference on Micro and Nano Engineering
Antal sider1
Publikationsdato2013
StatusUdgivet - 2013
Udgivet eksterntJa
Begivenhed39th International Conference on Micro and Nano Engineering - London, Storbritannien
Varighed: 16. sep. 201319. sep. 2013
Konferencens nummer: 39th

Konference

Konference39th International Conference on Micro and Nano Engineering
Nummer39th
Land/OmrådeStorbritannien
ByLondon
Periode16/09/201319/09/2013

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