Fabrication and characterization of one- and two-dimensional regular patterns produced employing multiple exposure holographic lithography

S. Tamulevičius, A. Jurkevičiute, N. Armakavičius, D. Virganavičius, L. Šimatonis, T. Tamulevičius*

*Kontaktforfatter for dette arbejde

Publikation: Bidrag til tidsskriftTidsskriftartikelForskningpeer review

Resumé

In this paper we describe fabrication and characterization methods of two-dimensional periodic microstructures in photoresist with pitch of 1.2 urn and lattice constant 1.2-4.8 μm, formed using two-beam multiple exposure holographic lithography technique. The regular structures were recorded employing different angular positions of the sample in between two and three sequential exposures, adding up fringes of various symmetries on thin positive tone photoresist layer spin-coated on floated glass substrates. After exposure and development, the resulting structures were analysed employing optical and scanning electron microscopy. It was demonstrated that structures with rhombus, triangular and square point lattice types with 2-fold, 4-fold or 6-fold rotational symmetry can be obtained. The results obtained from the micrographs were compared with the simulation results of interference field light intensity distribution. Camera images of the transmitted and diffracted laser beam light far field spatial distribution were compared with the fast Fourier transforms (FFT) of optical microscope dark field micrographs. Diffraction efficiency measurements were demonstrated as an efficient method to control quality of the structures as well as to optimize the multiple exposure processes.

OriginalsprogEngelsk
TidsskriftJournal of Optoelectronics and Advanced Materials
Vol/bind19
Udgave nummer3-4
Sider (fra-til)119-126
ISSN1454-4164
StatusUdgivet - 2017

Fingeraftryk

Photoresists
Lithography
lithography
Fabrication
fabrication
Diffraction efficiency
photoresists
Fast Fourier transforms
Spatial distribution
Lattice constants
Laser beams
Quality control
Microscopes
Cameras
Glass
Microstructure
Scanning electron microscopy
symmetry
Substrates
quality control

Citer dette

Tamulevičius, S. ; Jurkevičiute, A. ; Armakavičius, N. ; Virganavičius, D. ; Šimatonis, L. ; Tamulevičius, T. / Fabrication and characterization of one- and two-dimensional regular patterns produced employing multiple exposure holographic lithography. I: Journal of Optoelectronics and Advanced Materials. 2017 ; Bind 19, Nr. 3-4. s. 119-126.
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title = "Fabrication and characterization of one- and two-dimensional regular patterns produced employing multiple exposure holographic lithography",
abstract = "In this paper we describe fabrication and characterization methods of two-dimensional periodic microstructures in photoresist with pitch of 1.2 urn and lattice constant 1.2-4.8 μm, formed using two-beam multiple exposure holographic lithography technique. The regular structures were recorded employing different angular positions of the sample in between two and three sequential exposures, adding up fringes of various symmetries on thin positive tone photoresist layer spin-coated on floated glass substrates. After exposure and development, the resulting structures were analysed employing optical and scanning electron microscopy. It was demonstrated that structures with rhombus, triangular and square point lattice types with 2-fold, 4-fold or 6-fold rotational symmetry can be obtained. The results obtained from the micrographs were compared with the simulation results of interference field light intensity distribution. Camera images of the transmitted and diffracted laser beam light far field spatial distribution were compared with the fast Fourier transforms (FFT) of optical microscope dark field micrographs. Diffraction efficiency measurements were demonstrated as an efficient method to control quality of the structures as well as to optimize the multiple exposure processes.",
keywords = "Diffraction patterns, FFT, Holographic lithography, Interference, Periodic structures",
author = "S. Tamulevičius and A. Jurkevičiute and N. Armakavičius and D. Virganavičius and L. Šimatonis and T. Tamulevičius",
year = "2017",
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volume = "19",
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Fabrication and characterization of one- and two-dimensional regular patterns produced employing multiple exposure holographic lithography. / Tamulevičius, S.; Jurkevičiute, A.; Armakavičius, N.; Virganavičius, D.; Šimatonis, L.; Tamulevičius, T.

I: Journal of Optoelectronics and Advanced Materials, Bind 19, Nr. 3-4, 2017, s. 119-126.

Publikation: Bidrag til tidsskriftTidsskriftartikelForskningpeer review

TY - JOUR

T1 - Fabrication and characterization of one- and two-dimensional regular patterns produced employing multiple exposure holographic lithography

AU - Tamulevičius, S.

AU - Jurkevičiute, A.

AU - Armakavičius, N.

AU - Virganavičius, D.

AU - Šimatonis, L.

AU - Tamulevičius, T.

PY - 2017

Y1 - 2017

N2 - In this paper we describe fabrication and characterization methods of two-dimensional periodic microstructures in photoresist with pitch of 1.2 urn and lattice constant 1.2-4.8 μm, formed using two-beam multiple exposure holographic lithography technique. The regular structures were recorded employing different angular positions of the sample in between two and three sequential exposures, adding up fringes of various symmetries on thin positive tone photoresist layer spin-coated on floated glass substrates. After exposure and development, the resulting structures were analysed employing optical and scanning electron microscopy. It was demonstrated that structures with rhombus, triangular and square point lattice types with 2-fold, 4-fold or 6-fold rotational symmetry can be obtained. The results obtained from the micrographs were compared with the simulation results of interference field light intensity distribution. Camera images of the transmitted and diffracted laser beam light far field spatial distribution were compared with the fast Fourier transforms (FFT) of optical microscope dark field micrographs. Diffraction efficiency measurements were demonstrated as an efficient method to control quality of the structures as well as to optimize the multiple exposure processes.

AB - In this paper we describe fabrication and characterization methods of two-dimensional periodic microstructures in photoresist with pitch of 1.2 urn and lattice constant 1.2-4.8 μm, formed using two-beam multiple exposure holographic lithography technique. The regular structures were recorded employing different angular positions of the sample in between two and three sequential exposures, adding up fringes of various symmetries on thin positive tone photoresist layer spin-coated on floated glass substrates. After exposure and development, the resulting structures were analysed employing optical and scanning electron microscopy. It was demonstrated that structures with rhombus, triangular and square point lattice types with 2-fold, 4-fold or 6-fold rotational symmetry can be obtained. The results obtained from the micrographs were compared with the simulation results of interference field light intensity distribution. Camera images of the transmitted and diffracted laser beam light far field spatial distribution were compared with the fast Fourier transforms (FFT) of optical microscope dark field micrographs. Diffraction efficiency measurements were demonstrated as an efficient method to control quality of the structures as well as to optimize the multiple exposure processes.

KW - Diffraction patterns

KW - FFT

KW - Holographic lithography

KW - Interference

KW - Periodic structures

M3 - Journal article

VL - 19

SP - 119

EP - 126

JO - Journal of Optoelectronics and Advanced Materials

JF - Journal of Optoelectronics and Advanced Materials

SN - 1454-4164

IS - 3-4

ER -