Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves

C. L. C. Smith; A. H. Thilsted; C. E. Garcia-Ortiz; I. P. Radko; R. Marie; C. Jeppesen; C. Vannahme; S. I. Bozhevolnyi; A. Kristensen

doi:10.1021/nl5002058

Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves

C. L. C. Smith, A. H. Thilsted, C. E. Garcia-Ortiz, I. P. Radko, R. Marie, C. Jeppesen, C. Vannahme, S. I. Bozhevolnyi, A. Kristensen

Institut for Teknologi og Innovation

Publikation: Bidrag til tidsskrift › Tidsskriftartikel › Forskning › peer review

Abstract

We demonstrate the highly efficient (>50%) conversion of freely propagating light to channel plasmon-polaritons (CPPs) in gold V-groove waveguides using compact 1.6 mu m long waveguide-termination coupling mirrors. Our straightforward fabrication process, involving UV-lithography and crystallographic silicon etching, forms the coupling mirrors innately and ensures exceptional-quality, wafer-scale device production. We tailor the V-shaped profiles by thermal silicon oxidation in order to shift initially wedge-located modes downward into the V-grooves, resulting in well-confined CPPs suitable for nanophotonic applications.

Originalsprog	Engelsk
Tidsskrift	Nano Letters
Vol/bind	14
Udgave nummer	3
Sider (fra-til)	1659-1664
ISSN	1530-6984
DOI	https://doi.org/10.1021/nl5002058
Status	Udgivet - 2014

Dokumenter og links

10.1021/nl5002058

Citationsformater

@article{26615e615b8a413c8e3c9595df6e03c2,

title = "Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves",

abstract = "We demonstrate the highly efficient (>50%) conversion of freely propagating light to channel plasmon-polaritons (CPPs) in gold V-groove waveguides using compact 1.6 mu m long waveguide-termination coupling mirrors. Our straightforward fabrication process, involving UV-lithography and crystallographic silicon etching, forms the coupling mirrors innately and ensures exceptional-quality, wafer-scale device production. We tailor the V-shaped profiles by thermal silicon oxidation in order to shift initially wedge-located modes downward into the V-grooves, resulting in well-confined CPPs suitable for nanophotonic applications.",

author = "Smith, {C. L. C.} and Thilsted, {A. H.} and Garcia-Ortiz, {C. E.} and Radko, {I. P.} and R. Marie and C. Jeppesen and C. Vannahme and Bozhevolnyi, {S. I.} and A. Kristensen",

year = "2014",

doi = "10.1021/nl5002058",

language = "English",

volume = "14",

pages = "1659--1664",

journal = "Nano Letters",

issn = "1530-6984",

publisher = "American Chemical Society",

number = "3",

}

TY - JOUR

T1 - Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves

AU - Smith, C. L. C.

AU - Thilsted, A. H.

AU - Garcia-Ortiz, C. E.

AU - Radko, I. P.

AU - Marie, R.

AU - Jeppesen, C.

AU - Vannahme, C.

AU - Bozhevolnyi, S. I.

AU - Kristensen, A.

PY - 2014

Y1 - 2014

N2 - We demonstrate the highly efficient (>50%) conversion of freely propagating light to channel plasmon-polaritons (CPPs) in gold V-groove waveguides using compact 1.6 mu m long waveguide-termination coupling mirrors. Our straightforward fabrication process, involving UV-lithography and crystallographic silicon etching, forms the coupling mirrors innately and ensures exceptional-quality, wafer-scale device production. We tailor the V-shaped profiles by thermal silicon oxidation in order to shift initially wedge-located modes downward into the V-grooves, resulting in well-confined CPPs suitable for nanophotonic applications.

AB - We demonstrate the highly efficient (>50%) conversion of freely propagating light to channel plasmon-polaritons (CPPs) in gold V-groove waveguides using compact 1.6 mu m long waveguide-termination coupling mirrors. Our straightforward fabrication process, involving UV-lithography and crystallographic silicon etching, forms the coupling mirrors innately and ensures exceptional-quality, wafer-scale device production. We tailor the V-shaped profiles by thermal silicon oxidation in order to shift initially wedge-located modes downward into the V-grooves, resulting in well-confined CPPs suitable for nanophotonic applications.

U2 - 10.1021/nl5002058

DO - 10.1021/nl5002058

M3 - Journal article

C2 - 24524631

SN - 1530-6984

VL - 14

SP - 1659

EP - 1664

JO - Nano Letters

JF - Nano Letters

IS - 3

ER -

Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves

Abstract

Dokumenter og links

Fingeraftryk

Citationsformater