Comparison of the Tougaard, ARXPS, RBS and Ellipsometry methods to determine the thickness of thin SiO2 layers

Publikation: Bidrag til tidsskrift › Tidsskriftartikel › Forskning

Originalsprog	Engelsk
Tidsskrift	Surface and Interface Analysis
Vol/bind	33
Sider (fra-til)	238-44
ISSN	0142-2421
DOI	https://doi.org/10.1002/sia.1206
Status	Udgivet - 2002

Dokumenter og links

@article{dd392f60ba9811dc9626000ea68e967b,

title = "Comparison of the Tougaard, ARXPS, RBS and Ellipsometry methods to determine the thickness of thin SiO2 layers",

author = "B.S. Semak and Marel, \{C. van der\} and S. Tougaard",

year = "2002",

doi = "10.1002/sia.1206",

language = "English",

volume = "33",

pages = "238--44",

journal = "Surface and Interface Analysis",

issn = "0142-2421",

publisher = "Wiley",

}

TY - JOUR

T1 - Comparison of the Tougaard, ARXPS, RBS and Ellipsometry methods to determine the thickness of thin SiO2 layers

AU - Semak, B.S.

AU - Marel, C. van der

AU - Tougaard, S.

PY - 2002

Y1 - 2002

U2 - 10.1002/sia.1206

DO - 10.1002/sia.1206

M3 - Journal article

SN - 0142-2421

VL - 33

SP - 238

EP - 244

JO - Surface and Interface Analysis

JF - Surface and Interface Analysis

ER -