Albert Nerken Award “For contributions to the development of improved methods to characterize thin-film nanostructures by X-ray photoelectron spectroscopy”: http://www2.avs.org/symposium/AVS59/pages/majawards.html#Nerken)

Albert Nerken Award is given by the American Vacuum Society
"To recognize outstanding contributions to the solution of technological problems in areas of interest to AVS."
A nominee must be a recognized worker in his or her field with an outstanding record of sustained (5 years or more) contributions to the solution of technological problems.